Self-Assembly: Sacrificial-Post Templating Method for Block Copolymer Self-Assembly (Small 3/2014)
نویسندگان
چکیده
منابع مشابه
Sacrificial-post templating method for block copolymer self-assembly.
A sacrificial-post templating method is presented for directing block copolymer self-assembly to form nanostructures consisting of monolayers and bilayers of microdomains. In this approach, the topographical post template is removed after self-assembly and therefore is not incorporated into the final microdomain pattern. Arrays of nanoscale holes of different shapes and symmetries, including me...
متن کاملBlock copolymer self-assembly for nanophotonics.
The ability to control and modulate the interaction of light with matter is crucial to achieve desired optical properties including reflection, transmission, and selective polarization. Photonic materials rely upon precise control over the composition and morphology to establish periodic interactions with light on the wavelength and sub-wavelength length scales. Supramolecular assembly provides...
متن کاملDirected Self-Assembly of Block Copolymer, No1
/Description The PS-rich and neutral PS-b-PMMA block copolymer (BCP) films were spin coated on the neutral random copolymer hydroxyl-terminated PS-r-PMMA layers grafted on the native oxide and 50 nm thick PECVD amorphous silicon oxide layers. Relationship between the grafting density of BCP and surface density of hydroxyl moiety on silicon oxide is discussed. Furthermore, optimization of anneal...
متن کاملMultilayer block copolymer meshes by orthogonal self-assembly
Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist that facilitate significant control over otherwise unorganized assembly of BCP microdomains to form both long-range and locally complex monolayer patterns. In contrast, the extension of this control int...
متن کاملNext Generation Photoresists Using Block Copolymer Self-Assembly
Next generation photoresist systems using block copolymer self-assembly have been developed and characterized within the Ober Research Group. Block copolymers containing methacrylate polymer backbones have been designed for low absorption in 193 nm lithography. The polymers synthesized are composed of two polymer chains that can be selectively crosslinked or removed, respectively, from the poly...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Small
سال: 2014
ISSN: 1613-6810
DOI: 10.1002/smll.201470017